Layer-by-layer deposition of nano-patterned thin films optimised
Wednesday, 19 October 2011
New study focuses on characterisation of the thickness and topography of the thin films by atomic force microscopy (AFM) and by surface plasmon resonance (SPR) spectroscopy.
Authors of a new study have developed an optimised procedure for the layer-by-layer deposition of the Hofmann clathrate-like coordination compound either as continuous or as nano-patterned thin films. In the study researchers also report on characterisation of the thickness and topography of the thin films by atomic force microscopy (AFM) and by surface plasmon resonance (SPR) spectroscopy, which also yields the layer’s refractive index and losses. The study shows that the films are of good optical quality and the results of both AFM and SPR experiments are in good agreement with the theoretical predictions of the films thicknesses. The article is now available in the New Journal of Chemistry, 2011, 35, 2089-2094.
High quality nano-patterned thin films of the coordination compound deposited layer-by-layer developed. Source: Sheng Yaw Lim Fotolia.com
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